773972
Yttrium sputtering target
diam. × thickness 2.00 in. × 0.25 in., 99.9% trace metals basis
Synonym(s):
Yttrium
About This Item
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Quality Level
Assay
99.9% trace metals basis
form
solid
reaction suitability
core: yttrium
resistivity
57 μΩ-cm, 20°C
diam. × thickness
2.00 in. × 0.25 in.
bp
3338 °C (lit.)
mp
1522 °C (lit.)
density
4.469 g/mL at 25 °C (lit.)
SMILES string
[Y]
InChI
1S/Y
InChI key
VWQVUPCCIRVNHF-UHFFFAOYSA-N
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Application
Yttrium sputtering target can be used for physical vapor deposition of thin films of yttria stabilized zirconia layers for IT-SOFC. Yttrium containing thin films also find applications as thermal barrier and protective coatings, example in thermoelectric devices.
WGK
WGK 3
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Certificates of Analysis (COA)
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